<?xml version="1.0" encoding="UTF-8"?>
<article article-type="research-article" xml:lang="en-US" xmlns:xlink="http://www.w3.org/1999/xlink">
<front>
<journal-meta>
<journal-id journal-id-type="publisher">global-journal-of-science-frontier-research-a-physics-space-science</journal-id>
<journal-title-group>
<journal-title>Global Journal of Science Frontier Research - A: Physics &amp; Space Science</journal-title>
</journal-title-group>
<issn publication-format="print">0975-5896</issn>
<issn publication-format="electronic">2249-4626</issn>
<publisher><publisher-name>Global Journals Publishing Group Incorporated</publisher-name></publisher>
<self-uri xlink:href="https://globaljournals.org/journal-seo-export/jats/146015.xml" />
</journal-meta>
<article-meta>
<article-id pub-id-type="publisher-id">146015</article-id>
<title-group>
<article-title>Features of the Homogeneous Plasmonic Structures on Porous Silicon Formation</article-title>
</title-group>
<contrib-group>
<contrib contrib-type="author"><name><surname>Tynyshtykbayev</surname><given-names>Dr. Kurbangali B.</given-names></name><xref ref-type="aff" rid="aff1" />
</contrib>
</contrib-group>
<aff id="aff1">KAZAKHSTAN, Satbayev University</aff>
<pub-date publication-format="electronic" date-type="pub" iso-8601-date="2026-01-13">
<day>13</day>
<month>01</month>
<year>2026</year>
</pub-date>
<volume>25</volume>
<issue>A5</issue>
<fpage>9</fpage>
<lpage>18</lpage>
<abstract><p>In this work, we demonstrate the feasibility of fabricating uniform periodic plasmonic structure of Ni-PNP/por-Si by masking the wafer surface using optical lithography, followed by pore formation and deposition of plasmonic Ni-nanoparticles (Ni-PNP) in a single-step metalassisted electrochemical etching process. It is shown that the high energetics of nc-PS and of the nc-PS/c-Si interface facilitates the formation of uniform plasmonic Ni-PNP/PS structures using a single-step pore etching and deposition of plasmonic nanoparticles.</p></abstract>
<self-uri content-type="pdf" xlink:href="https://globaljournals.org/GJSFR_Volume25/2-Features-of-the-Homogeneous.pdf" />
<self-uri content-type="html" xlink:href="https://globaljournals.org/scholarly-articles/features-of-the-homogeneous-plasmonic-structures-on-porous-silicon-formation/" />
</article-meta>
</front>
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<p>In this work, we demonstrate the feasibility of fabricating uniform periodic plasmonic structure of Ni-PNP/por-Si by masking the wafer surface using optical lithography, followed by pore formation and deposition of plasmonic Ni-nanoparticles (Ni-PNP) in a single-step metalassisted electrochemical etching process. It is shown that the high energetics of nc-PS and of the nc-PS/c-Si interface facilitates the formation of uniform plasmonic Ni-PNP/PS structures using a single-step pore etching and deposition of plasmonic nanoparticles.</p>
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</body>
</article>