In this work, we demonstrate the feasibility of fabricating uniform periodic plasmonic structure of Ni-PNP/por-Si by masking the wafer surface using optical lithography, followed by pore formation and deposition of plasmonic Ni-nanoparticles (Ni-PNP) in a single-step metalassisted electrochemical etching process. It is shown that the high energetics of nc-PS and of the nc-PS/c-Si interface facilitates the formation of uniform plasmonic Ni-PNP/PS structures using a single-step pore etching and deposition of plasmonic nanoparticles.